Processing of PbTiO3 thin films. III. Effects of ion bombardment
نویسندگان
چکیده
منابع مشابه
architecture and engineering of nanoscale sculptured thin films and determination of their properties
چکیده ندارد.
15 صفحه اولGrowth mechanism of thin oxide films under low-energy oxygen-ion bombardment
Bombardment of silicon surfaces by low-energy oxygen ions has been investigated as a possible process for growing films ofSiOzat room temperature. Broad ion beams ofenergy 40-200 eV and variable oxygen content have been used to grow ultrathin oxides of extremely uniform thickness. The ion beam oxides are similar to thin thermal oxides in many respects-composition, chemical binding, optical, and...
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X-ray diffraction (XRD) and Raman spectroscopy were used to investigate stress dependence on thickness in PbTiO3 (PTO) films grown by pulsed liquid injection Metalorganic Chemical Vapor Deposition on a LaAlO3 (001) substrate (LAO). Films on sapphire substrate (R-plane) were used as polycrystalline film reference. Epitaxial PTO films with a dominant c-domain structure are grown on LAO substrate ...
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Electrical resistivity measurements are used to study damage in CrSi2 thin films induced by Ne, Ar, or Xe ion irradiation over a fluence range of 10-10 ions cm• Irradiation produces a factor of 5-12 increase in film conductivity at the higher fluences. The influence of defect generation and recombination is evident. We speculate that formation of a compound defect is a dominant factor enhancing...
متن کاملShort-circuit boundary conditions in ferroelectric PbTiO3 thin films
We examine the application of short-circuit electrical boundary conditions in density-functional theory calculations of ferroelectric thin films. Modeling PbTiO3 films with metallic electrodes, we demonstrate that under periodic boundary conditions of supercells, short-circuit conditions for the electrodes are equivalently satisfied in two repeated slab geometries: a PbTiO3/metal superlattice g...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
سال: 1996
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.579910